San Francisco — Applied Materials Inc. took a big step into the high-k/metal-gate arena last week, rolling out a trio of tools for advanced gate-stack and related applications at 45 nanometers. Intel ...
The IC industry is headed toward a new era of scaling–and uncertainty–as chip makers race to develop the key building blocks for the next-generation transistor: high-k dielectrics and metal gates.
Dynamic Random Access Memory (DRAM) serves as the backbone of modern computing, enabling devices ranging from smartphones to high-performance servers. As the demand accelerates for higher density and ...
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