Shares of ASML ( ASML -17.02%) were tumbling today after the leading producer of lithography equipment for semiconductors ...

Since the 1980s, cutting-edge lithography has shifted from the 365 nm 'i-line' of mercury vapour lamps to deep-ultraviolet light from excimer lasers at 248 nm (krypton fluoride lasers) and 193 nm ...

China has announced a significant advancement in silicon photonics technology, potentially circumventing U.S. export ...

China's latest technological breakthroughs in homegrown deep ultraviolet (DUV) lithography machines mark a significant milestone in the country's semiconductor manufacturing equipment sector ...

Recent advancements in light-based lithography, including EUVL, have significantly improved semiconductor manufacturing.

9 announcement from the Ministry of Industry and Information Technology, or MIIT, which advised State-linked organizations to use domestically developed deep ultraviolet, or DUV, lithography machines.

These licenses relate to the service of deep ultraviolet lithography (DUV) machines and are due to expire at the end of 2024. These reports came amid US government plans to pressure allies in ...