Dec 17, 2018 · SCREEN and IBM Sign Agreement for Next-Generation EUV Lithography Cleaning Process Development - Agreement builds on more than a decade of collaboration …

SCREENホールディングスの会社概要のページです。 会社概要および組織一覧を掲載しています。 グループ会社案内のPDFもダウンロードしていただけます。

This page provides materials for SCREEN Holdings’ shareholders and investors. It contains a range of information, including details of shareholders meetings, management policies, share …

SCREEN has defined its purpose as “Innovation for a Sustainable World.” The continued evolution of semiconductor devices will be the basis for a wide range of technologies with the …

Single Wafer Cleaner SU-3400 The Evolution of the World's No. 1* Cleaning Equipment * Based on SCREEN in-house research

PlateRite 8600NII-Z/S/E De facto standard 8 page thermal CtP delivering the best balance of productivity and exposure quality These systems feature the latest fiber laser diode exposure …

The SS-80EX features the same advanced spin scrubber technology developed by SCREEN over many years while also delivering significantly improved functionality. High-speed processing of …

Company Profile Our Network Global Network SCREEN SPE GERMANY GmbH SCREEN SPE USA, LLC SCREEN SPE KOREA CO., Ltd. SCREEN ELECTRONICS SHANGHAI CO., Ltd. …

4. Emissions reduction solution (optional) An optional exhaust recirculation system reduces total emissions by 65%, ensuring clean equipment operation to support ESG measures. 1. Based …

1. High Throughput The FC-3100 is capable of achieving a high throughput of 1,000 wafers per hour, which has been realized by incorporating a high throughput buffer module and a high …